发明名称 Self-ionized sputtering apparatus
摘要 There is provided a low-cost self-sputtering apparatus which is so arranged that, even when an arc discharge occurs for some reasons or other, failure in electric discharge can be prevented. The self-sputtering apparatus has a vacuum chamber in which a substrate to be processed is disposed; a target to be disposed opposite to the substrate; a sputtering power source for charging the target with a negative DC current; an anode shield which is disposed in a manner to enclose a space in front of the target and which is charged with a positive electric potential; and a gas introduction means for introducing a predetermined sputtering gas into the vacuum chamber. The apparatus further has an LC resonance circuit in parallel with an output circuit from the DC power source to the target.
申请公布号 US2010230280(A1) 申请公布日期 2010.09.16
申请号 US20100659268 申请日期 2010.03.02
申请人 ULVAC, INC. 发明人 NAKAMURA SHINYA;IWASAWA HIROAKI;IKEDA YOSHIHIRO
分类号 C23C14/34 主分类号 C23C14/34
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