| 摘要 |
System and method for quality assurance for reticles used in manufacturing of integrated circuits. According to an embodiment, the present invention provides a method for inspecting one or more blanks For example, the blanks are prepared to be used as reticles for manufacturing of integrated circuits. The method includes a step for providing a blank. For example, the blank includes an unknown level of impure particles. The method also includes a step for subjecting the blank to radiation at a first radiation level. The method additionally includes a step for receiving reflected radiation by the radiation source. Also, the method includes a step for determining a particle level based on at least the reflected radiation. Additionally, the method includes a step for determining whether to use the blank to produce a reticle.
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