SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PURPOSE: A substrate processing apparatus and a method for manufacturing the same are provided to shield heat radiated toward an O-ring from a heater by installing a gas introduction unit on a line for connecting the heater and the O-ring. CONSTITUTION: A processing chamber(203) is installed in a processing container(201). A susceptor(217) is installed in the processing container. A through hole(217a) is installed in the susceptor. A heating unit(217h) for heating a substrate is installed in the susceptor. A gas introduction unit(203a) is installed to the upper side of the processing container. A gas supplying pipe(234) supplies processing gas into the processing container.