发明名称 |
SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. |
摘要 |
<p>A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap.</p> |
申请公布号 |
NL2004305(A) |
申请公布日期 |
2010.09.14 |
申请号 |
NL20102004305 |
申请日期 |
2010.02.26 |
申请人 |
ASML NETHERLANDS B.V., |
发明人 |
STAVENGA, MARCO;SHULEPOV, SERGEI;STEFFENS, KOEN;LIEROP, MATHIEUS;DAVID, SAMUEL;BESSEMS, DAVID |
分类号 |
G03F7/20;G03F9/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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