发明名称 |
Photomask inspection apparatus |
摘要 |
According to one aspect of the present invention, there is provided a photomask inspection apparatus which observes a pattern provided on a mask substrate of a mask to inspect the mask including an object lens, and a liquid that is present between a last lens in the side closer to the mask of the object lens and the mask.
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申请公布号 |
US7796343(B2) |
申请公布日期 |
2010.09.14 |
申请号 |
US20070964318 |
申请日期 |
2007.12.26 |
申请人 |
LASERTEC CORPORATION |
发明人 |
TAKEHISA KIWAMU;KUSUNOSE HARUHIKO;AWAMURA NAOKI |
分类号 |
G02B3/00;G01N21/00;G02B1/06;G02B3/12;G02B9/00 |
主分类号 |
G02B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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