发明名称 FLARE-MEASURING MASK, FLARE-MEASURING METHOD, AND EXPOSURE METHOD
摘要 A method for measuring flare information of a projection optical system includes arranging, on an object plane of the projection optical system, a sectoral pattern 3A surrounded by a first side (3Aa), a second side (3Ab) which is inclined at a predetermined angle with respect to the first side (3Aa), and an inner diameter portion (3Ac) and an outer diameter portion (3Ad) which connect both ends of the first side (3Aa) and both ends of the second side (3Ab); projecting an image of the sectoral pattern (3A) via the projection optical system; and determining the flare information based on a light amount of the image of the sectoral pattern 3A and a light amount provided at a position away from the image. With the flare measuring method, it possible to correctly measure the flare information in an arbitrary angle range.
申请公布号 WO2010101048(A1) 申请公布日期 2010.09.10
申请号 WO2010JP52802 申请日期 2010.02.17
申请人 NIKON CORPORATION;SHIRAISHI, MASAYUKI 发明人 SHIRAISHI, MASAYUKI
分类号 G03F1/14;G03F7/20 主分类号 G03F1/14
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