发明名称 POLYAMIC ACID AND POLYIMIDE, PROCESSES FOR THE PRODUCTION OF SAME, COMPOSITIONS CONTAINING SAME, AND USES THEREOF
摘要 <p>The purpose of the present invention is to provide a polyimide resin which exhibits higher heat resistance than that of a conventional polyimide resin by controlling the geometric configuration of the constituent units. Provided is a polyamic acid which comprises repeating units represented by general formula (1), wherein the 1,4-bismethylenecyclohexane skeleton units consist of both trans- and cis-form units, and the contents of the trans- and cis-form units are 60 to 100% and 0 to 40% respectively (with the sum total of the trans- and cis-form units being 100%).</p>
申请公布号 WO2010100874(A1) 申请公布日期 2010.09.10
申请号 WO2010JP01332 申请日期 2010.02.26
申请人 MITSUI CHEMICALS, INC.;FUKUKAWA, KENICHI;OKAZAKI, MASAKI;SAKATA, YOSHIHIRO;FUJIO, ICHIRO;YAMASHITA, WATARU 发明人 FUKUKAWA, KENICHI;OKAZAKI, MASAKI;SAKATA, YOSHIHIRO;FUJIO, ICHIRO;YAMASHITA, WATARU
分类号 C08G73/10 主分类号 C08G73/10
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