THIOPYRAN DERIVATIVE, POLYMER, RESIST COMPOSITION, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SUCH RESIST COMPOSITION

摘要

To provide a thiopyran derivative, having a structure expressed by the following general formula 1: where X is O or S; R1 is—H,—CH3, C2-4 alkyl group, thioether group, or ketone group; R2 is—H,—CH3, or trifluoromethyl group; and R1 and R2 may be identical to or different from each other.