| 摘要 |
An in-line wafer measurement data compensation method is presented, and the steps of the method includes: acquire a pre-wafer measurement data, a current wafer measurement data, and a current offset; establish an auto regressive integrated moving average (ARIMA) model and an exponential weighted integrated moving average (EWIMA) model, and input the pre-wafer measurement data, the current wafer measurement data, and the current offset to the ARIMA model and the EWIMA model; then get outputs of the ARIMA model and EWIMA model, wherein the outputs are wafer estimation data. Thereby, the semiconductor manufacturer could reduce the sampling time of an in-line measurement and still maintain an acceptable production performance and maintain control process stability.
|
