发明名称 |
PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a projection optical system that can efficiently correct high-order unsymmetrical aberration in pupil depending on image height. <P>SOLUTION: The projection optical system 16 that projects an image of a first object 15 to a second object 17 includes a plurality of optical elements, a deformation means and a control unit 111. The deformation means deforms a deformable optical element LE satisfying a predetermined conditional formula included in the plurality of optical elements by applying a force to the deformable optical element LE. The control unit 111 controls the deformation unit, the deformable optical element LE has n fixed positions 203 on an outer circumference. The deformation unit includes n actuators 201. The n actuators 201 apply a forces to n positions on the outer circumference other than the fixed n positions 203. The control unit 111 controls each of the n actuators 201 independently. <P>COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010199293(A) |
申请公布日期 |
2010.09.09 |
申请号 |
JP20090042437 |
申请日期 |
2009.02.25 |
申请人 |
CANON INC |
发明人 |
YAMADA AKIHIRO;SHIGENOBE ATSUSHI;KITAMURA TSUTOMU |
分类号 |
H01L21/027;G02B17/08;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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