发明名称 PROJECTION OPTICAL DEVICE, EXPOSURE DEVICE AND METHOD OF MANUFACTURING DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a projection optical device, applied to a scanning type exposure device, for example, to thereby improve throughput related to scanning exposure. <P>SOLUTION: The projection optical device includes: a lighting optical system (IL) having light source optical systems (20, 21) forming a plurality of light sources and applying light from the light source optical systems to a first surface (M); and a projection optical system (PL) having a plurality of mirror elements arranged in positions optically conjugate with the positions of the plurality of light sources to reflect the light from the first surface and forming an image of the first surface based on the light from the plurality of mirror elements. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010197629(A) 申请公布日期 2010.09.09
申请号 JP20090041586 申请日期 2009.02.25
申请人 NIKON CORP 发明人 KIUCHI TORU;NARA KEI
分类号 G03F7/20;G02B17/08;H01L21/027 主分类号 G03F7/20
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