发明名称 Line pattern formation method
摘要 A line pattern is formed on a substrate by performing a first step and a second step. In the first step, a liquid material containing a pattern formation material dispersed or dissolved therein is dropped onto the substrate and dried. In the second step, the liquid material is dropped onto a dried body that has been obtained by drying the liquid material in the first step. In the second step, the liquid material is dropped at a smaller ejection amount than that of the first step. Further, the pitch of dropping the liquid material onto the substrate in the first step and the pitch of dropping the liquid material onto the dried body in the second step are less than or equal to a jaggy generation limit.
申请公布号 US2010224392(A1) 申请公布日期 2010.09.09
申请号 US20100659292 申请日期 2010.03.03
申请人 FUJIFILM CORPORATION 发明人 OKAMORI KAZUAKI
分类号 H05K1/00;B05D5/12 主分类号 H05K1/00
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