发明名称 |
Antireflective coatings for high-resolution photolithographic synthesis of DNA arrays |
摘要 |
The present invention provides an array of polymers and methods of forming arrays of polymers by providing a substrate having a first layer including one or more dielectric coatings on a solid support and a second layer including a plurality of polymers disposed on the first layer. The invention also provides methods for forming an array of polymers on a substrate using light-directed synthesis by providing a substrate having a first layer including one or more dielectric coatings on a solid support, derivatizing the first layer by contacting the first layer with a silanation reagent, and a second layer disposed on said first layer wherein the second layer includes functional groups protected with a photolabile protecting group.
|
申请公布号 |
US7790389(B2) |
申请公布日期 |
2010.09.07 |
申请号 |
US20080014879 |
申请日期 |
2008.01.16 |
申请人 |
AFFYMETRIX, INC. |
发明人 |
TRULSON MARK O.;MCGALL GLENN H.;SYWE BEI-SHEN;KAJISA LISA T.;TRUONG DANA;RAVA RICHARD P.;GOLDBERG MARTIN J. |
分类号 |
C12Q1/68;G01N33/53;B01J19/00;C12M1/00;C12N15/09;C40B40/06;G01N37/00;G03F7/09 |
主分类号 |
C12Q1/68 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|