发明名称 Semiconductor component and method
摘要 A semiconductor component and method of making a semiconductor component. One embodiment provides a first metallization structure electrically coupled to charge compensation zones via an ohmic contact and to drift zones via a Schottky contact. A second metallization structure, which is arranged opposite the first metallization structure, is electrically coupled to the charge compensation zones via a Schottky contact and to drift zones via an ohmic contact.
申请公布号 US7791138(B2) 申请公布日期 2010.09.07
申请号 US20080261838 申请日期 2008.10.30
申请人 INFINEON TECHNOLOGIES AUSTRIA AG 发明人 PFIRSCH FRANK
分类号 H01L29/76;H01L27/095;H01L29/94 主分类号 H01L29/76
代理机构 代理人
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