发明名称 MASK FOR SEQUENTIAL LATERAL SOLIDIFICATION (SLS) PROCESS AND A METHOD FOR CRYSTALLIZING AMORPHOUS SILICON BY USING THE SAME
摘要 A mask for sequential lateral solidification (SLS) processes including at least one first window, one second window, one third window, and one fourth window is provided. Each window has a length extending longitude on the mask. The second window is aligned to the first window. The width of the first window is greater than that of the second window. The fourth window is aligned to the third window. The width of the third window is greater than that of the fourth window.
申请公布号 US2010221900(A1) 申请公布日期 2010.09.02
申请号 US20100777808 申请日期 2010.05.11
申请人 SUN MING-WEI 发明人 SUN MING-WEI
分类号 H01L21/20 主分类号 H01L21/20
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