发明名称 |
FINE-STRUCTURE TRANSFER APPARATUS AND METHOD |
摘要 |
A fine-structure transfer method in which a fine-featured pattern formed on one of the two surfaces of a stamper is pressed against a coating of a resist on one of the two surfaces of a transfer element so as to transfer the fine-featured pattern to the resist coating, wherein the atmosphere in the space between the stamper and the transfer element is replaced by the vapor of the resist before the stamper is pressed against the transfer element. Also disclosed is a fine-structure transfer apparatus having at least a stamper and a stage on which to place a transfer element having a coating of a resist, further having a device for heating the resist coating to be vaporized or a device for supplying the vapor of the resist into the space between the stamper and the transfer element.
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申请公布号 |
US2010219548(A1) |
申请公布日期 |
2010.09.02 |
申请号 |
US20100711377 |
申请日期 |
2010.02.24 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
MORI KYOICHI;YAMASHITA NAOAKI;SHIZAWA NORITAKE;TSUSHIMA KOJI |
分类号 |
C23C16/02;B29C35/08 |
主分类号 |
C23C16/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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