发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus comprising a load port in which a transfer container containing a plurality of substrates is placed, and a container storage part for storing the transfer container, the substrate processing apparatus for increasing the number of times at which the transfer container is transferred to and from the load port, whereby the substrates are processed with a high throughput. <P>SOLUTION: The substrate processing apparatus, which utilizes a first transfer apparatus 104A and a second transfer apparatus 104B which are configured to transfer a transfer container 10 containing a plurality of substrates, along a first transfer path 102A and a second transfer path 102B whose lateral positions differ from each other, respectively, includes a first load port 21 where the transfer container 10 is loaded and unloaded by the first transfer apparatus 104A, and a second load port 22 that is arranged stepwise with respect to the first load port 21, the transfer container 10 being loaded to and unloaded from the second load port by the second transfer apparatus 104B. <P>COPYRIGHT: (C)2010,JPO&INPIT</p>
申请公布号 JP2010192855(A) 申请公布日期 2010.09.02
申请号 JP20090038431 申请日期 2009.02.20
申请人 TOKYO ELECTRON LTD 发明人 KAMIKAWA YUJI;TSUCHIYA TAKAFUMI;EGASHIRA KOJI
分类号 H01L21/677;H01L21/027;H01L21/304 主分类号 H01L21/677
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