| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus for improving a throughput by devising a regeneration procedure of a drying solvent. Ž<P>SOLUTION: A control part 51 supplies the drying solvent from one of a first storage tank 11 and a second storage tank 13 to a processing bath 5 to dry-process a substrate W in the processing bath 5. When the drying solvent of the first storage tank with the drying solvent supplied reaches the end of its usefulness, after the process of the substrate W finishes, the drying solvent is supplied from only the second storage tank 13 different from the first storage tank 11 to the processing bath 5 to process the successive substrate W in the processing bath 5. With this, because the control part 51 supplies the drying solvent from the first storage tank 11 to the solvent regenerating apparatus 3 to regeneration-process, no interruption of the processing in the drying process apparatus 1 of the substrate processing apparatus involved in the regeneration process is required to be able to improve the throughput of the substrate processing apparatus. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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