| 摘要 |
PROBLEM TO BE SOLVED: To provide a porous silica film having a low refractive index, maintaining the refractive index for a long period of time, having high hardness and excellent adhesiveness of the film to a material to be coated, and to provide a method for manufacturing the film. SOLUTION: There is provided the porous silica film wherein pores which are present on a surface of the film and inside the film are only micropores having a diameter of≤2 nm, and the pencil hardness is≥5H and a refractive index is≤1.33 when a light having a wavelength of 655 nm is made incident on the film surface at the incident angle of 75 degrees by use of a spectral ellipsometer. The film is manufactured by a method including a step of mixing and reacting at least tetraalkyl orthosilicate, methanol or ethanol, a hydroxyketone derivative and water. COPYRIGHT: (C)2010,JPO&INPIT
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