发明名称 Process for Manufacturing a Non-Volatile Memory Electronic Device Integrated on a Semiconductor Substrate and Corresponding Device
摘要 A non-volatile memory electronic device integrated on a semiconductor substrate includes non-volatile memory cells organized in a matrix, and circuitry associated therewith. Each memory cell includes a gate electrode projecting from the semiconductor substrate. Source and drain regions are formed in the semiconductor substrate and aligned with the gate electrodes. At least one portion of the gate electrodes are insulated from each other by air-gaps which are closed on top by a third non-conforming dielectric layer.
申请公布号 US2010221904(A1) 申请公布日期 2010.09.02
申请号 US20100779150 申请日期 2010.05.13
申请人 BRAZZELLI DANIELA;SERVALLI GIORGIO;CAROLLO ENZO 发明人 BRAZZELLI DANIELA;SERVALLI GIORGIO;CAROLLO ENZO
分类号 H01L21/28 主分类号 H01L21/28
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