| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a film deposition process which can provide sufficient piezoelectric properties even under annealing at ≤600°C, as a method for depositing a piezoelectric ceramic using an aerosol deposition process. Ž<P>SOLUTION: The method for depositing a piezoelectric ceramic film 4, using an aerosol deposition process, on an electrode 3 formed at the face of a substrate 2, includes: a film deposition step s3 where the powder of piezoelectric ceramic is jetted onto the electrode by an aerosol deposition process to deposit a piezoelectric ceramic film; a laser irradiation step s4 where the film face of the piezoelectric ceramic is irradiated with ultraviolet laser beam; and an annealing step s5 where, after the irradiation of the laser beam, the substrate is heat-treated at ≤600°C; wherein by the laser irradiation step and the annealing step, the piezoelectric ceramic film is crystallized. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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