| 摘要 |
PURPOSE: A gas processing device is provided to heat gas at higher temperature by reducing the loss of heat after arranging a chamber in both side of a heater. CONSTITUTION: A gas processing device comprises a chamber(110) and a heater(120). The chamber forms a space where gas reacts. The heater is arranged along a surface which has a wide width in a one direction outside the chamber and heats the inside of the heater. A plurality of chambers are arranged. The chamber is arranged so that the surfaces which have a wide surface in a one direction face each other. The heater is located between the chambers.
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