发明名称 Vertical field-effect transistor
摘要 A vertical field-effect transistor having a semiconductor layer, in which a doped channel region is arranged along a depression. A “buried” terminal region leads as far as a surface of the semiconductor layer. The field-effect transistor also has a doped terminal region near an opening of the depression as well as the doped terminal region remote from the opening, a control region arranged in the depression, and an electrical insulating region between the control region and the channel region. The terminal region remote from the opening leads as far as a surface containing the opening or is electrically conductively connected to an electrically conductive connection leading to the surface. The control region is arranged in only one depression. The field-effect transistor is a drive transistor at a word line or at a bit line of a memory cell array.
申请公布号 US7786530(B2) 申请公布日期 2010.08.31
申请号 US20050521528 申请日期 2005.11.03
申请人 INFINEON TECHNOLOGIES AG 发明人 KAKOSCHKE RONALD;TEWS HELMUT
分类号 H01L27/10;H01L29/76;H01L21/336;H01L21/8247;H01L27/115;H01L29/78;H01L29/788;H01L29/792;H01L29/94 主分类号 H01L27/10
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