发明名称 Method of forming memory cell using gas cluster ion beams
摘要 A variable resistance memory cell structure and a method of forming it. The method includes forming a first electrode, forming an insulating material over the first electrode, forming a via in the insulating material to expose a surface of the first electrode, forming a heater material within the via using gas cluster ion beams, forming a variable resistance material within the via, and forming a second electrode such that the heater material and variable resistance material are provided between the first and second electrodes.
申请公布号 US7785978(B2) 申请公布日期 2010.08.31
申请号 US20090365473 申请日期 2009.02.04
申请人 MICRON TECHNOLOGY, INC. 发明人 SMYTHE JOHN
分类号 H01L21/8239 主分类号 H01L21/8239
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