发明名称 Method for manufacturing magnetoresistive element
摘要 There is provided a method for manufacturing a magnetoresistive element having a magnetization pinned layer, a magnetization free layer, and a spacer layer including an insulating layer arranged between the magnetization pinned layer and the magnetization free layer and current paths passing through the insulating layer. The method includes, in producing the spacer layer, depositing a first non-magnetic metal layer forming the current paths, depositing a second metal layer to be converted into the insulating layer on the first non-magnetic metal layer, and performing two stages of oxidation treatments in which a partial pressure of an oxidizing gas in a first oxidation treatment is set to 1/10 or less of a partial pressure of an oxidizing gas in a second oxidation treatment, and the second metal layer being irradiated with an ion beam or a RF plasma of a rare gas in the first oxidation treatment.
申请公布号 US7785662(B2) 申请公布日期 2010.08.31
申请号 US20060583968 申请日期 2006.10.20
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 FUJI YOSHIHIKO;FUKUZAWA HIDEAKI;YUASA HIROMI;IWASAKI HITOSHI
分类号 H05H1/00;H01F41/00;H01F41/22 主分类号 H05H1/00
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