Chemical Vapor Deposition Apparatus,申请号KR20080021123-传众专利搜索

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发明名称	Chemical Vapor Deposition Apparatus
摘要
申请公布号	KR100978567(B1)	申请公布日期	2010.08.27
申请号	KR20080021123	申请日期	2008.03.06
申请人		发明人
分类号	C23C16/46;C23C16/00	主分类号	C23C16/46
代理机构		代理人
主权项
地址

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