发明名称 CONDENSATION REACTION PRODUCT FOR FILLING POLYSILOXANE-BASED TRENCH AND METHOD FOR MANUFACTURING TRENCH FILLING FILM
摘要 PROBLEM TO BE SOLVED: To provide a condensation reaction product for filling a trench having good storage stability of a solution suitable for using for filling the trench formed in a substrate with silicon oxide and high filling performance, permitting the formation of a thick film, and having good crack resistance, and provide a method for manufacturing a trench filling film. SOLUTION: A condensation reaction product for filling a trench contains: a condensation reaction product of polysiloxane compound and silica particles; and a mixed solvent comprising an organic solvent (A) having a vapor pressure of 530 Pa or above at 20°C and a boiling point of 80°C or above and below 130°C and an organic solvent (B) having a vapor pressure of below 530 Pa at 20°C and a boiling point of 130°C or above and 200°C or below; or an organic solvent (C) having a vapor pressure of 530 Pa or above at 20°C and a boiling point of 130°C or above and 200°C or below. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010186938(A) 申请公布日期 2010.08.26
申请号 JP20090031269 申请日期 2009.02.13
申请人 ASAHI KASEI E-MATERIALS CORP 发明人 MORIYAMA REIKO;SAITO HIDEO;TAKADA SHOZO
分类号 H01L21/312;C08G77/12;C08G77/44;H01L21/316;H01L21/76 主分类号 H01L21/312
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