发明名称 |
CONDENSATION REACTION PRODUCT FOR FILLING POLYSILOXANE-BASED TRENCH AND METHOD FOR MANUFACTURING TRENCH FILLING FILM |
摘要 |
PROBLEM TO BE SOLVED: To provide a condensation reaction product for filling a trench having good storage stability of a solution suitable for using for filling the trench formed in a substrate with silicon oxide and high filling performance, permitting the formation of a thick film, and having good crack resistance, and provide a method for manufacturing a trench filling film. SOLUTION: A condensation reaction product for filling a trench contains: a condensation reaction product of polysiloxane compound and silica particles; and a mixed solvent comprising an organic solvent (A) having a vapor pressure of 530 Pa or above at 20°C and a boiling point of 80°C or above and below 130°C and an organic solvent (B) having a vapor pressure of below 530 Pa at 20°C and a boiling point of 130°C or above and 200°C or below; or an organic solvent (C) having a vapor pressure of 530 Pa or above at 20°C and a boiling point of 130°C or above and 200°C or below. COPYRIGHT: (C)2010,JPO&INPIT |
申请公布号 |
JP2010186938(A) |
申请公布日期 |
2010.08.26 |
申请号 |
JP20090031269 |
申请日期 |
2009.02.13 |
申请人 |
ASAHI KASEI E-MATERIALS CORP |
发明人 |
MORIYAMA REIKO;SAITO HIDEO;TAKADA SHOZO |
分类号 |
H01L21/312;C08G77/12;C08G77/44;H01L21/316;H01L21/76 |
主分类号 |
H01L21/312 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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