发明名称 Treated Chalcogenide Layer for Semiconductor Devices
摘要 A phase change memory and a method of manufacture are provided. The phase change memory includes a layer of phase change material treated to increase the hydrophobic nature of the phase change material. The hydrophobic nature of the phase change material improves adhesion between the phase change material and an overlying mask layer. The phase change material may be treated, for example, with a plasma comprising N2, NH3, Ar, He, O2, H2, or the like.
申请公布号 US2010213431(A1) 申请公布日期 2010.08.26
申请号 US20090617294 申请日期 2009.11.12
申请人 YEH TUNG-TI;CHEN CHIH-MING;YU CHUNG-YI;TSAI CHENG-YUAN;CHEN NENG-KUO;TSAI CHIA-SHIUNG 发明人 YEH TUNG-TI;CHEN CHIH-MING;YU CHUNG-YI;TSAI CHENG-YUAN;CHEN NENG-KUO;TSAI CHIA-SHIUNG
分类号 H01L29/24;H01L21/10 主分类号 H01L29/24
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