发明名称 FILM DEPOSITION METHOD, PANEL MANUFACTURING APPARATUS, AND ANNEALING APPARATUS
摘要 PROBLEM TO BE SOLVED: To improve the crystal orientation intensity distribution of a MgO protective film. SOLUTION: When a MgO film is deposited while conveying a substrate 10 with leading one ridge thereof, the (111) crystal orientation intensity of two ridges (both ridges) orthogonal to the leader of the substrate 10 is lower than that of the center part between both ridges. When a heater 38 for annealing is divided into a plurality of small heaters 38a, and heated so that both side ridges of the substrate 10 are hotter than the center part, the (111) crystal orientation intensity of the two ridges becomes higher, and the in-plane distribution of the (111) crystal orientation intensity is enhanced. COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010185100(A) 申请公布日期 2010.08.26
申请号 JP20090028837 申请日期 2009.02.10
申请人 ULVAC JAPAN LTD 发明人 IIJIMA EIICHI;KURAUCHI TOSHIHARU;HAKOMORI MUNEHITO
分类号 C23C14/58;H01J9/02;H01J11/00;H01J11/02;H01J11/22;H01J11/34;H01J11/40 主分类号 C23C14/58
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