发明名称 |
CHAMBER SHIELD FOR VACUUM PHYSICAL VAPOR DEPOSITION |
摘要 |
A physical vapor deposition apparatus includes a vacuum chamber with side walls, a cathode, a radio frequency power supply, a substrate support, and anode, and a shield. The cathode is inside the vacuum chamber and is configured to include a target. The radio frequency power supply is configured to apply power to the cathode. The substrate support is inside and electrically isolated from the side walls of the vacuum chamber. The anode is inside and electrically connected to the side walls of the vacuum chamber. The shield is inside and electrically connected to the side walls of the vacuum chamber and includes an annular body and a plurality of concentric annular projections extending from the annular body. |
申请公布号 |
WO2010068624(A3) |
申请公布日期 |
2010.08.26 |
申请号 |
WO2009US67145 |
申请日期 |
2009.12.08 |
申请人 |
FUJIFILM CORPORATION;LI, YOUMING;BIRKMEYER, JEFFREY |
发明人 |
LI, YOUMING;BIRKMEYER, JEFFREY |
分类号 |
H01L21/203 |
主分类号 |
H01L21/203 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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