NANOLITHOGRAPHY PROCESS

摘要

The invention pertains to a method for replicating a pattern, said method comprising: (a) providing patterned template, wherein said patterned template comprises a patterned template surface having a plurality of recessed or protruded areas formed therein; (b) contacting a volume of a curable perfluoropolyether composition [composition (C)] with said patterned template surface, said composition comprising: - at least one functional perfluoropolyether compound [compound (E)], said compound (E) comprising a (per)fluoropolyoxyalkylene chain [chain (Rf)], wherein the molecular weight of said chain Rf is more than 1000 and less than 3500; and at least two unsaturated moieties; and - at least one photoinitiator; (c) submitting to UV radiations said composition (C) to yield a mould comprising a patterned mould surface, and separating said mould from said patterned template; (d) contacting said patterned mould surface with a (pre)polymer composition [composition (P)]; (e) processing said composition (P) to yield an article having a patterned surface, and separating said article from said mould.