发明名称 METAL SOURCE AND DRAIN TRANSISTOR HAVING HIGH DIELECTRIC CONSTANT GATE INSULATOR
摘要 The invention is directed to a device for regulating the flow of electric current with high dielectric constant gate insulating layer and a source and/or drain forming a Schottky contact or Schottky-like region with a substrate and its fabrication method. In one aspect, the gate insulating layer has a dielectric constant greater than the dielectric constant of silicon. In another aspect, the current regulating device may be a MOSFET device, optionally a planar P-type or N-type MOSFET, having any orientation. In another aspect, the source and/or drain may consist partially or fully of a silicide.
申请公布号 US2010213556(A1) 申请公布日期 2010.08.26
申请号 US20100719760 申请日期 2010.03.08
申请人 AVOLARE 2, LLC 发明人 SNYDER JOHN P.;LARSON JOHN M.
分类号 H01L21/28;H01L29/78;H01L21/336;H01L21/8234;H01L27/095;H01L29/10;H01L29/417;H01L29/47;H01L29/51 主分类号 H01L21/28
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