| 摘要 |
PURPOSE: A method for treating substrates and its apparatus are provided to uniformly treat all regions of the substrate without additional configurations by spraying chemical on a rotating substrate. CONSTITUTION: A substrate is transferred to through a transferring roller(100) to a process section. The substrate transferred to the process section is lifted and is separated from the transferring roller. A rotation roller(200) is driven and the lifted substrate is rotated to the horizontal direction. A chemical(C) is sprayed through an air sprayer in the rotating substrate. The chemical is sprayed in the partial domain including the rotation center of the substrate.
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