DISPENSING UNIT AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE SAME

摘要

PURPOSE: An emission unit and a substrate processing apparatus including the same are provided to improve a whole production yield of the substrate by preventing a substrate from being polluted with a chemical. CONSTITUTION: A first injection tube(110) is arranged to the state perpendicular to the lower part of a substrate(10). The first injection tube sprays gas(G) through a first top end part(112) on a lower surface(12) of the substrate. A second injection pipe(120) is parallelly arranged to the first injection pipe on the lower part of the substrate. The second injection pipe sprays washing solution through a second top end part on the lower surface of the substrate. A third injection pipe is parallelly arranged to the first injection pipe on the lower part of the substrate. The third injection pipe sprays chemical through the third top end part on the lower surface of substrate.