| 摘要 |
An arc monitor system locates an arc based on optimal frames from a frame obtained before an arc discharge to a frame obtained immediately after the arc discharge. The arc monitor system, used to locate an occurred place of an arc discharge that occurred in an electric facility, includes multiple monitor cameras arranged at multiple places in the electric facility, an image processing device that processes images received from the respective monitor cameras, a control logic section that controls the image processing device, and an operation device that includes a display section and an operation section and is connected to the control logic section. The image processing device and the control logic section extract a change in the images received from the monitor cameras in response to a control signal generated from the electric facility on an occurrence of the arc discharge, and then locate an occurred place of the arc discharge.
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