| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a means for further improving degree of cleaning in a method for cleaning an apparatus for a borazine compound. Ž<P>SOLUTION: The method for cleaning the apparatus for a borazine compund comprises: a first irradiating step of irradiating a site to be cleaned in the apparatus with a first ultrasonic wave having a frequency of ≤100 kHz; and a second irradiating step of irradiating the site to be cleaned with a second ultrasonic wave having a frequency of >100 kHz. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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