发明名称 LITHOGRAPHY IMPRINTING SYSTEM
摘要 <P>PROBLEM TO BE SOLVED: To provide a lithography imprinting system wherein channels or holes in the template holding the nano-imprint mold are used. Ž<P>SOLUTION: There are provided a method and a system to create and maintain a desired environment in the vicinity of a nano-imprint lithography template by creation of a partial vacuum using channels or holes in the template holding the nano-imprint mold. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
申请公布号 JP2010179655(A) 申请公布日期 2010.08.19
申请号 JP20100063842 申请日期 2010.03.19
申请人 MOLECULAR IMPRINTS INC 发明人 CHERALA ANSHUMAN;LAD PANKAJ B;MCMACKIN IAN M;CHOI BYUNG-JIN
分类号 B29C59/02;H01L21/027 主分类号 B29C59/02
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