摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography imprinting system wherein channels or holes in the template holding the nano-imprint mold are used. Ž<P>SOLUTION: There are provided a method and a system to create and maintain a desired environment in the vicinity of a nano-imprint lithography template by creation of a partial vacuum using channels or holes in the template holding the nano-imprint mold. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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