发明名称 |
SUBSTRATE MOUNTING MECHANISM, SUBSTRATE PROCESSING APPARATUS, METHOD FOR SUPPRESSING FILM DEPOSITION ON SUBSTRATE MOUNTING MECHANISM, AND STORAGE MEDIUM |
摘要 |
A substrate mounting mechanism on which a target substrate is placed is provided. The substrate mounting mechanism includes a heater plate, which has a substrate mounting surface on which the target substrate is placed and has a heater embedded therein to heat the substrate to a deposition temperature at which a film is deposited. The substrate mounting mechanism also includes a temperature control jacket, which is formed to cover at least a surface of the heater plate other than the substrate mounting surface and adjusts the temperature to a non-deposition temperature below the deposition temperature.
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申请公布号 |
US2010210115(A1) |
申请公布日期 |
2010.08.19 |
申请号 |
US20100722193 |
申请日期 |
2010.03.11 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
HARA MASAMICHI;GOMI ATSUSHI;MAEKAWA SHINJI;TAGA SATOSHI;YAMAMOTO KAORU |
分类号 |
H01L21/477;H05B3/68 |
主分类号 |
H01L21/477 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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