| 摘要 |
PROBLEM TO BE SOLVED: To provide a method and a device for setting a condition for measuring a pattern by which measurement with high reproducibility can be performed not depending on the formation state of the pattern inside and outside an FOV. SOLUTION: In the method of setting the condition for measuring the pattern of a charged particle beam device and the device of setting the condition for measuring the pattern, a beam condition of an SEM is derived based on pattern information in and/or out of the field of view of the SEM obtained from design data of a sample on which a pattern is formed. Furthermore, as one of embodiments of the method and the device, a method and a device for setting a condition for measuring a pattern are provided to derive an optical condition in accordance with the pattern information of a region where the FOV is set. COPYRIGHT: (C)2010,JPO&INPIT |
