发明名称 BEAM SHAPING DEVICE
摘要 A beam shaping device (1; 50; 60) comprising first (3) and second (4) substrates, a liquid crystal layer (2) sandwiched between the substrates, and a first electrode layer (5; 51) provided on a side of the first substrate (3) facing the liquid crystal layer (2). The beam shaping device is controllable between beam shaping states, each permitting passage of light through the beam shaping device, and further comprises an insulating layer (7) covering the first electrode layer (5; 51) and a second electrode layer (6; 53) provided on top of the insulating layer. The second electrode layer (6; 53) comprises a conductor pattern exposing a portion of the insulating layer (7). The beam shaping device is configured in such a way that application of a voltage (V) between the first (5; 51) and second (6; 53) electrode layers causes liquid crystal molecules comprised in a portion of the liquid crystal layer (2) corresponding to the exposed portion of the insulating layer to tilt in a plane perpendicular to the liquid crystal layer, resulting in a local refractive index gradient, thereby enabling shaping of a beam (8) of light passing through the beam shaping device.
申请公布号 US2010208185(A1) 申请公布日期 2010.08.19
申请号 US20080678517 申请日期 2008.09.12
申请人 KONINKLIJKE PHILIPS ELECTRONICS N.V. 发明人 VAN BOMMEL TIES;HIKMET RIFAT ATA MUSTAFA;KRAAN THOMAS CASPAR;DESSAUD NATHALIE MAGALI DANIELLE;STROMER JAN FRANK
分类号 G02F1/1343 主分类号 G02F1/1343
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