发明名称 THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: A thin film transistor array panel and a method for manufacturing the same are provided to prevent a semiconductor from being exposed to moisture, external ions, and oxygen by successively depositing a semiconductor and a semiconductor protective film. CONSTITUTION: A gate electrode is formed on a substrate(S10). A gate insulating film is formed on the gate electrode(S20). A semiconductor is deposited on the gate insulating film(S30). An insulating film is deposited on the semiconductor(S40). A semiconductor layer and a pre-protective film for the semiconductor are formed using one mask(S50). A first opening and a second opening are formed in the pre-protective film for the semiconductor to form a semiconductor protective film(S60). A source electrode and a drain electrode are formed on the semiconductor protective film(S80).
申请公布号 KR20100091469(A) 申请公布日期 2010.08.19
申请号 KR20090010666 申请日期 2009.02.10
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 HEO, SEONG KWEON;SHIN, MIN CHUL;PARK, CHANG MO
分类号 H01L29/786 主分类号 H01L29/786
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