发明名称 |
THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: A thin film transistor array panel and a method for manufacturing the same are provided to prevent a semiconductor from being exposed to moisture, external ions, and oxygen by successively depositing a semiconductor and a semiconductor protective film. CONSTITUTION: A gate electrode is formed on a substrate(S10). A gate insulating film is formed on the gate electrode(S20). A semiconductor is deposited on the gate insulating film(S30). An insulating film is deposited on the semiconductor(S40). A semiconductor layer and a pre-protective film for the semiconductor are formed using one mask(S50). A first opening and a second opening are formed in the pre-protective film for the semiconductor to form a semiconductor protective film(S60). A source electrode and a drain electrode are formed on the semiconductor protective film(S80). |
申请公布号 |
KR20100091469(A) |
申请公布日期 |
2010.08.19 |
申请号 |
KR20090010666 |
申请日期 |
2009.02.10 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
HEO, SEONG KWEON;SHIN, MIN CHUL;PARK, CHANG MO |
分类号 |
H01L29/786 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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