APPARATUS AND METHOD FOR CLEANING SUBSTRAE, AND FACILITY FOR CLEANIG SUBSTRATE USING THE SAME

摘要

PURPOSE: An apparatus and a method for cleaning substrates, and a facility for cleaning the substrates using the same are provided to improve a substrate cleaning power by applying the pressure of cleaning pads to the substrates. CONSTITUTION: A transferring unit(110) transfers substrates to a first direction. A cleaning unit is arranged on a transferring path. The cleaning unit pressurizes a rotating cleaning head to the substrates to eliminate foreign materials from the substrates. The cleaning unit includes an upper cleaning unit(220a) and a lower cleaning unit(220b). The upper cleaning unit is arranged on the upper side of the transferring path. The lower cleaning unit is arranged on the lower side of the transferring path.