发明名称 |
A method for generating extreme ultraviolet radiation and an extreme ultraviolet light source device |
摘要 |
<p>To achieve pulse-stretched EUV radiation without putting a large heat load on electrodes or requiring sophisticated control, a pulsed power is supplied between a first electrode and a second electrode provided inside a chamber to form a narrow discharge channel therebetween. A laser beam from a laser source irradiates high temperature plasma material to form low temperature plasma gas having an ion density of approximately 10 17 to 10 20 cm -3 which is supplied to a narrow discharge channel formed between the electrodes. Electric discharge acts on the low temperature plasma gas to raise the electron temperature, resulting in high temperature plasma. As a result, EUV radiation is produced. Since the low temperature plasma gas is continuously supplied to the discharge channel, the pinch effect or confining effect of its self-magnetic field is repeated, resulting in the continuation of EUV radiation.</p> |
申请公布号 |
EP2046100(B1) |
申请公布日期 |
2010.08.18 |
申请号 |
EP20080017220 |
申请日期 |
2008.09.30 |
申请人 |
TOKYO INSTITUTE OF TECHNOLOGY;USHIODENKI KABUSHIKI KAISHA |
发明人 |
HOSOKAI, TOMONAO;HORIOKA, KAZUHIKO;SEKI, KYOHEI;YOKOYAMA, TAKUMA |
分类号 |
H05G2/00 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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