发明名称 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
摘要 A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R1 to R10 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.
申请公布号 US7776509(B2) 申请公布日期 2010.08.17
申请号 US20080021269 申请日期 2008.01.28
申请人 CANON KABUSHIKI KAISHA 发明人 ITO TOSHIKI;YAMAGUCHI TAKAKO
分类号 G03F7/039;C08G65/40;G03F7/20;G03F7/30 主分类号 G03F7/039
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