发明名称 Method for significant reduction of dislocations for a very high A1 composition A1GaN layer
摘要 A method for reducing dislocation density between an AlGaN layer and a sapphire substrate involving the step of forming a self-organizing porous AlN layer of non-coalescing column-like islands with flat tops on the substrate.
申请公布号 US7776636(B2) 申请公布日期 2010.08.17
申请号 US20060411191 申请日期 2006.04.25
申请人 CAO GROUP, INC. 发明人 WANG TAO
分类号 H01L21/00 主分类号 H01L21/00
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