| 摘要 |
<p>PURPOSE: A developing apparatus, a developing method, and a storing media are provided to uniformly contact a developing solution and a substrate by suppressing the solution spattering phenomenon of the substrate. CONSTITUTION: A substrate supporting unit horizontally supports a substrate. A rotary unit rotates the substrate around a vertical axis. A first nozzle(21) supplies a developing solution to the substrate on the substrate supporting unit. A second nozzle(22) supplies a pre-wetting solution to the surface of the substrate. A nozzle supporting unit moves the first nozzle and the second nozzle over the substrate. A controller(10) outputs controlling signals with respect to each part of a developing apparatus.</p> |
