| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma generation apparatus and a plasma generation method, wherein unevenness of density distribution of plasma and nonuniformity of thin film are improved. <P>SOLUTION: An antenna array wherein a plurality of antenna elements formed by covering rod-like antenna bodies with dielectric are arranged in parallel to a metal plate at constant intervals in a plasma container, is used. The antenna array is configured such that the antenna elements adjacent to each other are respectively protruded from wall surfaces opposite to each other, of the plasma container. When a power is fed to the antenna array, a phase of a high-frequency signal is changed such that the phase of the high-frequency signal fed to the antenna elements is shifted by 90° between the antenna elements adjacent to each other. Plasma is generated by radiation of electromagnetic wave of the antenna array. <P>COPYRIGHT: (C)2010,JPO&INPIT |
