| 摘要 |
PURPOSE: A device for coating a substrate is provided to prevent vortex in a coating process by controlling the distance between the substrate and a disc relatively. CONSTITUTION: A device for coating a substrate is comprised of a rotation unit, a disc(3), and a distance change unit(4). The disc is arranged in lower part of the substrate and has at least same diameter as the substrate. The distance change unit changes the distance between the substrate and the disc.
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