| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus which removes a liquid from the vicinity of a substrate effectively without generating vibration or other disturbances. <P>SOLUTION: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential between both ends of the porous member may be maintained at the bubble point or below of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. <P>COPYRIGHT: (C)2010,JPO&INPIT |
| 申请公布号 |
JP2010177715(A) |
申请公布日期 |
2010.08.12 |
| 申请号 |
JP20100116426 |
申请日期 |
2010.05.20 |
| 申请人 |
ASML NETHERLANDS BV;ASML HOLDING NV |
发明人 |
KEMPER NICOLAAS R;COX HENRIKUS HERMAN MARIE;DONDERS SJOERD NICOLAAS L;GRAAF ROELOF FREDERICK DE;HOOGENDAM CHRISTIAAN ALEXANDER;KATE NICOLAAS T;MERTENS JEROEN JOHANNES SOPHIA MARIA;VAN DER MEULEN FRITS;HERMAN MARIA TEUNISSEN FRANCISCUS JOHANNES;VAN DER TOORN JAN-GERARD C;VERHAGEN MARTINUS CORNELIS MARIA;BELFROID STEFAN PHILIP CHRISTIAAN;SMEULERS JOHANNES PETRUS MARIA;VOGEL HERMAN |
| 分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
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