发明名称 EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE
摘要 [Problem] An extreme ultraviolet light source device in accordance with the present invention suppresses a surface that comes into contact with a target material in a molten state from being eroded by the target material, being reacted with the target material, and being cut by the target material. [Means for Resolution] A target generating unit 120 injects molten tin in a droplet shape as a target 201 into a chamber 101. A protective coating provided with an erosion resistance property to tin is configured on a section that comes into contact with tin in a molten state for each face of a nozzle part 121 and a tank part 122. Alternatively, a part that comes into contact with tin in a molten state is made of a material provided with an erosion resistance property and a heat resistance property.
申请公布号 US2010200776(A1) 申请公布日期 2010.08.12
申请号 US20100695630 申请日期 2010.01.28
申请人 GIGAPHOTON INC. 发明人 YABU TAKAYUKI;ASAYAMA TAKESHI;YOSHIDA FUMIKA;WAKABAYASHI OSAMU
分类号 G01J3/10 主分类号 G01J3/10
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